发明授权
US06730983B2 Semiconductor device with spiral inductor and method for fabricating semiconductor integrated circuit device 失效
具有螺旋电感的半导体器件及半导体集成电路器件的制造方法

  • 专利标题: Semiconductor device with spiral inductor and method for fabricating semiconductor integrated circuit device
  • 专利标题(中): 具有螺旋电感的半导体器件及半导体集成电路器件的制造方法
  • 申请号: US09960333
    申请日: 2001-09-24
  • 公开(公告)号: US06730983B2
    公开(公告)日: 2004-05-04
  • 发明人: Yoshihiro Minami
  • 申请人: Yoshihiro Minami
  • 优先权: JP2000-295823 20000928
  • 主分类号: H01L2900
  • IPC分类号: H01L2900
Semiconductor device with spiral inductor and method for fabricating semiconductor integrated circuit device
摘要:
A spiral inductor comprising: a substrate; a protruding portion which is formed on the top face of the substrate and the top of which serves as a dummy element for controlling a chemical mechanical polishing process; and a conductive layer which is formed on the substrate so as to have a spiral shape and which serves as an induction element, wherein the protruding portion is formed in a region other than a region directly below the conductive layer.
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