发明授权
- 专利标题： Slide apparatus and its stage mechanism for use in vacuum
- 专利标题（中）： 滑动装置及其在真空中使用的舞台机构
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申请号： US10300338申请日： 2002-11-20
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公开(公告)号： US06732610B2公开(公告)日： 2004-05-11
- 发明人: Akira Higuchi , Takayuki Kato , Kenichi Iwasaki
- 申请人： Akira Higuchi , Takayuki Kato , Kenichi Iwasaki
- 优先权： JP11-214244 19990728; JP11-227958 19990811; JP11-273889 19990928
- 主分类号： F16C3266
- IPC分类号： F16C3266
摘要：
The XY stage mechanism comprises a Y slide shaft 2 penetrating through only one side surface of the wall surfaces of a vacuum chamber 1 for holding a stage base plate in a cantilevered manner, a Y air slide bearing 4 for guiding the Y slide shaft 2, an X air slide plate 5, a first air slide bearing 6 for supporting the X air slide plate 5, a coupling portion 8, and a second X air slide bearing 9 serving as the guide of the coupling portion 8, whereby, in a state where not only the Y slide shaft is floated up but also the X air slide plate and coupling portion are floated up, the XY stage is driven.