发明授权
- 专利标题: Apparatus for pulling single crystal by CZ method
- 专利标题(中): 用CZ法拉单晶的装置
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申请号: US09775287申请日: 2001-02-01
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公开(公告)号: US06733585B2公开(公告)日: 2004-05-11
- 发明人: Hiroshi Inagaki , Shigeki Kawashima , Makoto Kamogawa , Tadashi Hata
- 申请人: Hiroshi Inagaki , Shigeki Kawashima , Makoto Kamogawa , Tadashi Hata
- 优先权: JP2000-023527 20000201; JP2000-054893 20000229; JP2000-054894 20000229; JP2000-054895 20000229; JP2000-054896 20000229
- 主分类号: C30B1520
- IPC分类号: C30B1520
摘要:
In a Czochralski (CZ) single crystal puller equipped with a cooler and a thermal insulation member, which are to be disposed in a CZ furnace, smooth recharge and additional charge of material are made possible. Further, elimination of dislocations from a silicon seed crystal by use of the Dash's neck method can be performed smoothly. To these ends, there is provided a CZ single crystal puller, wherein a cooler and a thermal insulation member are immediately moved upward away from a melt surface during recharge or additional charge of material or during elimination of dislocations from a silicon seed crystal by use of the Dash's neck method.
公开/授权文献
- US20020144641A1 Apparatus for pulling single crystal by CZ method 公开/授权日:2002-10-10
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