发明授权
US06733618B2 Disturbance-free, recipe-controlled plasma processing system and method
有权
无干扰,配方控制等离子体处理系统和方法
- 专利标题: Disturbance-free, recipe-controlled plasma processing system and method
- 专利标题(中): 无干扰,配方控制等离子体处理系统和方法
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申请号: US09946503申请日: 2001-09-06
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公开(公告)号: US06733618B2公开(公告)日: 2004-05-11
- 发明人: Akira Kagoshima , Hideyuki Yamamoto , Shoji Ikuhara , Toshio Masuda , Hiroyuki Kitsunai , Junichi Tanaka , Natsuyo Morioka , Kenji Tamaki
- 申请人: Akira Kagoshima , Hideyuki Yamamoto , Shoji Ikuhara , Toshio Masuda , Hiroyuki Kitsunai , Junichi Tanaka , Natsuyo Morioka , Kenji Tamaki
- 优先权: JP2001-198830 20010629
- 主分类号: C23F100
- IPC分类号: C23F100
摘要:
A plasma processing control system and method which can suppress influences caused by disturbances. The control system includes a plasma processor for performing processing operation over a sample accommodated within a vacuum processing chamber, a sensor for monitoring process parameters during processing operation of the plasma processor, a processed-result estimation model for estimating a processed result on the basis of a monitored output of the sensor and a preset processed-result prediction equation, and an optimum recipe calculation model for calculating correction values of processing conditions on the basis of an estimated result of the processed-result estimation model in such a manner that the processed result becomes a target value. The plasma processor is controlled on the basis of a recipe generated by the optimum recipe calculation model.