发明授权
- 专利标题: Electrode for p-type gallium nitride-based semiconductors
- 专利标题(中): p型氮化镓基半导体电极
-
申请号: US10187465申请日: 2002-06-28
-
公开(公告)号: US06734091B2公开(公告)日: 2004-05-11
- 发明人: Tchang-Hun Oh , Hong K. Choi , Bor-Yeu Tsaur , John C. C. Fan , Shirong Liao , Jagdish Narayan
- 申请人: Tchang-Hun Oh , Hong K. Choi , Bor-Yeu Tsaur , John C. C. Fan , Shirong Liao , Jagdish Narayan
- 主分类号: H01L2128
- IPC分类号: H01L2128
摘要:
An improved electrode for a p-type gallium nitride based semiconductor material is disclosed that includes a layer of an oxidized metal and a first and a second layer of a metallic material. The electrode is formed by depositing three or more metallic layers over the p-type semiconductor layer such that at least one metallic layer is in contact with the p-type semiconductor layer. At least two of the metallic layers are then subjected to an annealing treatment in the presence of oxygen to oxidize at least one of the metallic layers to form a metal oxide. The electrodes provide good ohmic contacts to p-type gallium nitride-based semiconductor materials and, thus, lower the operating voltage of gallium nitride-based semiconductor devices.
公开/授权文献
信息查询