Invention Grant
US06734097B2 Liner with poor step coverage to improve contact resistance in W contacts
有权
衬垫差步幅覆盖，以提高W触点的接触电阻
- Patent Title: Liner with poor step coverage to improve contact resistance in W contacts
- Patent Title (中): 衬垫差步幅覆盖，以提高W触点的接触电阻
-
Application No.: US09965094Application Date: 2001-09-28
-
Publication No.: US06734097B2Publication Date: 2004-05-11
- Inventor: Roy C. Iggulden , Padraic Shafer , Werner Robl , Kwong Hon Wong
- Applicant: Roy C. Iggulden , Padraic Shafer , Werner Robl , Kwong Hon Wong
- Main IPC: H01L214763
- IPC: H01L214763
Abstract:
A method of filling a damascene structure with liner and W characterized by improved resistance and resistance spread and adequate adhesion comprising: a given damascene structure coated by a liner which purposely provides poor step coverage into the afore mentioned structure, followed by a CVD W deposition, and followed by a metal isolation technique.
Public/Granted literature
- US20030068894A1 Liner with poor step coverage to improve contact resistance in W contacts Public/Granted day:2003-04-10
Information query
