发明授权
- 专利标题: Fluid treatment process
- 专利标题(中): 流体处理工艺
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申请号: US09837653申请日: 2001-04-19
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公开(公告)号: US06736976B2公开(公告)日: 2004-05-18
- 发明人: Apostolos Kantzas , Cooper H. Langford , Amit Bhargava , Alex Starosud
- 申请人: Apostolos Kantzas , Cooper H. Langford , Amit Bhargava , Alex Starosud
- 主分类号: C02F128
- IPC分类号: C02F128
摘要:
A fluid treatment device for reducing the level of a chemical compound in a fluid. The device comprises: a fluid inlet; a fluid outlet; a flow-through fluid treatment zone having comprising: a radiation source, an adsorbent and a photocatalyst. The fluid treatment zone is reversibly operable between: (i) a first mode in which the fluid flows in a first direction and at least a portion of the chemical compound is adsorbed on the adsorbent; and (ii) a second mode in which the fluid flows in a second direction different from the first direction in which the absorbed chemical compound is exposed to radiation from the radiation resulting in photooxidation of the chemical compound.
公开/授权文献
- US20020040874A1 Fluid treatment device and process for treating fluid 公开/授权日:2002-04-11
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