发明授权
- 专利标题: Optical magnification adjustment system and projection exposure device
- 专利标题(中): 光学倍率调节系统和投影曝光装置
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申请号: US10289786申请日: 2002-11-07
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公开(公告)号: US06738195B2公开(公告)日: 2004-05-18
- 发明人: Noriyoshi Matsumoto , Nozomu Kowatari , Youichi Hirabayashi
- 申请人: Noriyoshi Matsumoto , Nozomu Kowatari , Youichi Hirabayashi
- 优先权: JP2001-655425 20011121; JP2001-356784 20011122
- 主分类号: G02B1502
- IPC分类号: G02B1502
摘要:
An optical magnification adjustment system being capable of minutely correcting magnification. A first lens 1 of plano-convex is installed on the side of an object surface 5, and a second lens 2 of concave-plano is installed on the side of a formed image surface 7. By controlling the center space d between the first lens and the second lens, the image is enlarged or reduced. The radii of curvature R2 and R3 of the convex surface of the first lens and the concave surface of the second lens are respectively set according to the following equations. R2=(1−n1)/&phgr;2 R3=(n2−1)/&phgr;3 where, &phgr;2 and &phgr;3 represent optical power, and n1 and n2 represent refraction indexes, respectively.