发明授权
US06743566B2 Cyclic acetal compound, polymer, resist composition and patterning process
有权
环状缩醛化合物，聚合物，抗蚀剂组合物和图案化工艺
- 专利标题： Cyclic acetal compound, polymer, resist composition and patterning process
- 专利标题（中）： 环状缩醛化合物，聚合物，抗蚀剂组合物和图案化工艺
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申请号： US10219139申请日： 2002-08-16
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公开(公告)号： US06743566B2公开(公告)日： 2004-06-01
- 发明人: Mutsuo Nakashima , Seiichiro Tachibana , Takeru Watanabe , Takeshi Kinsho , Koji Hasegawa , Tsunehiro Nishi , Jun Hatakeyama
- 申请人： Mutsuo Nakashima , Seiichiro Tachibana , Takeru Watanabe , Takeshi Kinsho , Koji Hasegawa , Tsunehiro Nishi , Jun Hatakeyama
- 优先权： JP2000-301933 20001002; JP2001-010087 20010118; JP2001-031720 20010208
- 主分类号： G03C500
- IPC分类号： G03C500
摘要：
Cyclic acetal compounds of formula (1) wherein k=0 or 1 and n is an integer of 0 to 6 are novel. Using the cyclic acetal compounds as a monomer, polymers are obtained. A resist composition comprising the polymer as a base resin is sensitive to high-energy radiation and has excellent sensitivity, resolution, and etching resistance.
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