发明授权
- 专利标题: Method and system for making cobalt silicide
- 专利标题(中): 制造硅化钴的方法和系统
-
申请号: US10166307申请日: 2002-06-10
-
公开(公告)号: US06743721B2公开(公告)日: 2004-06-01
- 发明人: Water Lur , David Lee , Kuang-Chih Wang
- 申请人: Water Lur , David Lee , Kuang-Chih Wang
- 主分类号: H01L2144
- IPC分类号: H01L2144
摘要:
A cluster tool and a number of different processes for making a cobalt-silicide material are disclosed. Combinations of alloyed layers of Co—Ti— along with layers of Co— are arranged and heat treated so as to effectuate a silicide reaction. The resulting structures have extremely low resistance, and show little line width dependence, thus making them particularly attractive for use in semiconductor processing. A cluster tool is configured with appropriate sputter targets/heat assemblies to implement many of the needed operations for the silicide reactions, thus resulting in higher savings, productivity, etc.
公开/授权文献
- US20030228745A1 Method and system for making cobalt silicide 公开/授权日:2003-12-11