- 专利标题: Method of measuring pore depth on the surface of a polishing pad
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申请号: US10435440申请日: 2003-05-09
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公开(公告)号: US06745631B2公开(公告)日: 2004-06-08
- 发明人: Chih-Kun Chen , Chung-Min Lin
- 申请人: Chih-Kun Chen , Chung-Min Lin
- 优先权: TW91117354A 20020801
- 主分类号: G01N2918
- IPC分类号: G01N2918
摘要:
A method of measuring pore depth on the surface of a polishing pad during processing. In the present invention, a planar ultrasound sensing device is disposed a predetermined distance above the surface of a polishing pad. The planar ultrasound sensing device sends out a plurality of ultrasound signals to the surface and the pores therein, and receives a plurality of reflected signals from the pad surface and constituent pores. The difference between pore depth and the surface is determined to establish first depth difference data according to the time delay in the reflected signals. The polishing pad is rotated to obtain second to Nth depth difference data. A relational image relative to the surface and the pores of the polishing pad is obtained according to the first to Nth depth difference data.
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