发明授权
- 专利标题: Apparatus for and method of cleaning objects to be processed
- 专利标题(中): 用于清洁待处理物体的设备和方法
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申请号: US10013550申请日: 2001-12-13
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公开(公告)号: US06746543B2公开(公告)日: 2004-06-08
- 发明人: Yuji Kamikawa , Satoshi Nakashima , Kinya Ueno
- 申请人: Yuji Kamikawa , Satoshi Nakashima , Kinya Ueno
- 优先权: JP8-256638 19960927
- 主分类号: B08B300
- IPC分类号: B08B300
摘要:
A cleaning apparatus and a cleaning method for cleaning a object are provided. In the cleaning apparatus, a drying chamber 42 and a cleaning bath 41 are separated from each other up and down, respectively. Thus, a space in the drying chamber 42 can be insulated from a space of the cleaning bath 41 through rotary doors 59a and a slide door 72. In the cleaning method, a cleaning process in the cleaning bath 41 is carried out while sealing it by the rotary doors 59a. On the other hand, a drying process in the drying chamber 42 is accomplished while sealing and closing it by the slide door 72. Consequently, there is no possibility that, during the drying process, the object is subjected to a bad influence from a chemical treatment.