A method of and apparatus for creating a second order non-linearity profile along a waveguide. The method comprises: thermally poling a waveguide structure to generate a second order non-linearity; placing a mask adjacent to the waveguide structure; and exposing the waveguide structure with UV light through the mask to selectively erase the second order non-linearity along the waveguide structure. The mask may be an amplitude mask or phase mask. In a preferred embodiment an amplitude mask is used in combination with an incoherent UV light source to produce selective erasure of a thermally poled second order non-linearity. Apparatus for carrying out this method and devices based on waveguide structure fabricated using the method are also described.