发明授权
US06752584B2 TRANSFER DEVICES FOR HANDLING MICROELECTRONIC WORKPIECES WITHIN AN ENVIRONMENT OF A PROCESSING MACHINE AND METHODS OF MANUFACTURING AND USING SUCH DEVICES IN THE PROCESSING OF MICROELECTRONIC WORKPIECES 失效
用于在处理机器的环境中处理微电子工件的转移装置以及在制造微电子工件中使用这些装置的方法

  • 专利标题: TRANSFER DEVICES FOR HANDLING MICROELECTRONIC WORKPIECES WITHIN AN ENVIRONMENT OF A PROCESSING MACHINE AND METHODS OF MANUFACTURING AND USING SUCH DEVICES IN THE PROCESSING OF MICROELECTRONIC WORKPIECES
  • 专利标题(中): 用于在处理机器的环境中处理微电子工件的转移装置以及在制造微电子工件中使用这些装置的方法
  • 申请号: US09875300
    申请日: 2001-06-05
  • 公开(公告)号: US06752584B2
    公开(公告)日: 2004-06-22
  • 发明人: Daniel J. WoodruffRandy Harris
  • 申请人: Daniel J. WoodruffRandy Harris
  • 主分类号: B66C2300
  • IPC分类号: B66C2300
TRANSFER DEVICES FOR HANDLING MICROELECTRONIC WORKPIECES WITHIN AN ENVIRONMENT OF A PROCESSING MACHINE AND METHODS OF MANUFACTURING AND USING SUCH DEVICES IN THE PROCESSING OF MICROELECTRONIC WORKPIECES
摘要:
Transfer devices for handling microelectronic workpieces, apparatus for processing microelectronic workpieces, and methods for manufacturing and using such transfer devices. One embodiment of a transfer device includes a transport unit configured to move along a linear track and a lift assembly carried by the transport unit. The transfer device can also include an arm assembly having an arm actuator carried by the lift assembly to move along a lift path and an arm carried by the arm actuator to rotate about the lift path. The arm can include a first extension projecting from one side of the lift path and a second extension projecting from another side of the lift path. The arm actuator can rotate the arm about the lift path. The transfer device can also include a first end-effector and a second end-effector. The first end-effector is rotatably coupled to the first section of the arm to rotate about a first rotation axis, and the second end-effector is rotatably coupled to the second extension of the arm to rotate about a second rotation axis. The first and second rotation axes can be generally parallel to the lift path, which itself can be substantially vertical, and the first and second end-effectors can be at different elevations relative to the arm.
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