Invention Grant
- Patent Title: Micro-casted silicon carbide nano-imprinting stamp
- Patent Title (中): 微型碳化硅纳米压印
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Application No.: US10279643Application Date: 2002-10-24
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Publication No.: US06755984B2Publication Date: 2004-06-29
- Inventor: Heon Lee , Gun-Young Jung
- Applicant: Heon Lee , Gun-Young Jung
- Main IPC: B44C122
- IPC: B44C122

Abstract:
A micro-casted silicon carbide nano-imprinting stamp and method of making a micro-casted silicon carbide nano-imprinting stamp are disclosed. A micro-casting technique is used to form a foundation layer and a plurality of nano-sized features connected with the foundation layer. The foundation layer and the nano-sized features are unitary whole that is made entirely from a material comprising silicon carbide (SiC) which is harder than silicon (Si) alone. As a result, the micro-casted silicon carbide nano-imprinting stamp has a longer service lifetime because it can endure several imprinting cycles without wearing out or breaking. The longer service lifetime makes the micro-casted silicon carbide nano-imprinting stamp economically feasible to manufacture as the manufacturing cost can be recouped over the service lifetime.
Public/Granted literature
- US20040081800A1 Micro-casted silicon carbide nano-imprinting stamp Public/Granted day:2004-04-29
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