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US06755984B2 Micro-casted silicon carbide nano-imprinting stamp 失效
微型碳化硅纳米压印

  • Patent Title: Micro-casted silicon carbide nano-imprinting stamp
  • Patent Title (中): 微型碳化硅纳米压印
  • Application No.: US10279643
    Application Date: 2002-10-24
  • Publication No.: US06755984B2
    Publication Date: 2004-06-29
  • Inventor: Heon LeeGun-Young Jung
  • Applicant: Heon LeeGun-Young Jung
  • Main IPC: B44C122
  • IPC: B44C122
Micro-casted silicon carbide nano-imprinting stamp
Abstract:
A micro-casted silicon carbide nano-imprinting stamp and method of making a micro-casted silicon carbide nano-imprinting stamp are disclosed. A micro-casting technique is used to form a foundation layer and a plurality of nano-sized features connected with the foundation layer. The foundation layer and the nano-sized features are unitary whole that is made entirely from a material comprising silicon carbide (SiC) which is harder than silicon (Si) alone. As a result, the micro-casted silicon carbide nano-imprinting stamp has a longer service lifetime because it can endure several imprinting cycles without wearing out or breaking. The longer service lifetime makes the micro-casted silicon carbide nano-imprinting stamp economically feasible to manufacture as the manufacturing cost can be recouped over the service lifetime.
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