发明授权
US06756137B2 Vapor-deposition material for the production of high-refractive-index optical layers, and process for the production of the vapor-deposition material 有权
用于生产高折射率光学层的蒸气沉积材料,以及用于生产气相沉积材料的方法

  • 专利标题: Vapor-deposition material for the production of high-refractive-index optical layers, and process for the production of the vapor-deposition material
  • 专利标题(中): 用于生产高折射率光学层的蒸气沉积材料,以及用于生产气相沉积材料的方法
  • 申请号: US10028980
    申请日: 2001-12-28
  • 公开(公告)号: US06756137B2
    公开(公告)日: 2004-06-29
  • 发明人: Uwe AnthesMartin Friz
  • 申请人: Uwe AnthesMartin Friz
  • 优先权: DE10065647 20001229
  • 主分类号: B32B1500
  • IPC分类号: B32B1500
Vapor-deposition material for the production of high-refractive-index optical layers, and process for the production of the vapor-deposition material
摘要:
A vapor-deposition material for the production of high-refractive-index optical layers of titanium oxide, titanium and lanthanum oxide under reduced pressure comprising a sintered mixture having the composition TiOx+z*La2O3, where x=1.5 to 1.8 and z=10 to 65% by weight, based on the total weight of the mixture. The constituents of the mixture are in the range of 10 to 65% by weight of lanthanum oxide, 38 to 74% by weight of titanium oxide and 2 to 7% by weight of titanium.
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