发明授权
- 专利标题: Method for the manufacture of electromagnetic radiation reflecting devices
- 专利标题(中): 制造电磁辐射反射装置的方法
-
申请号: US10295767申请日: 2002-11-14
-
公开(公告)号: US06759132B2公开(公告)日: 2004-07-06
- 发明人: Ubaldo Mastromatteo , Pietro Corona , Flavio Villa , Gabriele Barlocchi
- 申请人: Ubaldo Mastromatteo , Pietro Corona , Flavio Villa , Gabriele Barlocchi
- 优先权: EP01830701 20011114
- 主分类号: B32B900
- IPC分类号: B32B900
摘要:
Method for manufacturing electromagnetic radiation reflecting devices, said method comprising the steps of: a) providing a silicon substrate defined by at least one first free surface, b) forming on said first surface a layer of protective material provided with an opening which exposes a region of the first free surface, and c)etching the region of the free surface by means of an anisotropic agent to remove at least one portion of the substrate and define a second free surface of the substrate inclined in relation to said first surface. Furthermore, said first free surface is parallel to the crystalline planes {110} of silicon substrate and said step (c) comprises a progressing step of the anisotropic agent such that the second free surface resulting from the etching step is parallel to the planes {100} of said substrate.