Invention Grant
US06759265B2 Method for producing diaphragm sensor unit and diaphragm sensor unit
有权
膜片传感器单元和隔膜传感器单元的制造方法
- Patent Title: Method for producing diaphragm sensor unit and diaphragm sensor unit
- Patent Title (中): 膜片传感器单元和隔膜传感器单元的制造方法
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Application No.: US10268711Application Date: 2002-10-10
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Publication No.: US06759265B2Publication Date: 2004-07-06
- Inventor: Hans Artmann , Thorsten Pannek
- Applicant: Hans Artmann , Thorsten Pannek
- Main IPC: H01L2100
- IPC: H01L2100

Abstract:
In a method for producing a diaphragm sensor unit having a semiconductor material substrate, a flat diaphragm and an insulating well for thermal insulation below the diaphragm are generated, for the formation of sensor element structures for at least one sensor. The substrate, made of semiconductor material, in a specified region, which defines sensor element structures, receives a deliberately different doping from the surrounding semiconductor material, that porous semiconductor material is generated from semiconductor material sections between the regions distinguished by doping, and semiconductor material in the well region under semiconductor is rendered porous and under parts of the sensor element structure is removed and/or rendered porous.
Public/Granted literature
- US20030110867A1 Method for producing diaphragm sensor unit and diaphragm sensor unit Public/Granted day:2003-06-19
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