Invention Grant
- Patent Title: Method for polysilicon crystallization by simultaneous laser and rapid thermal annealing
- Patent Title (中): 同时激光和快速热退火的多晶硅结晶方法
-
Application No.: US10236608Application Date: 2002-09-06
-
Publication No.: US06759284B2Publication Date: 2004-07-06
- Inventor: Yu-Ming Kang , Shih-Ping Lin , Ting-Kuo Chang
- Applicant: Yu-Ming Kang , Shih-Ping Lin , Ting-Kuo Chang
- Main IPC: H01L2120
- IPC: H01L2120

Abstract:
A method for polysilicon crystallization by simultaneous laser and rapid thermal annealing is disclosed. In the method, a substrate that has an amorphous silicon layer on top is first provided and positioned on a conveyor situated inside a temperature-controlled chamber. The temperature-controlled chamber is equipped with a window in a top wall that is substantially transparent to thermal and laser energy. A beam of thermal energy and simultaneously a beam of laser energy merged with the thermal energy is then directed through the window onto a top surface of the substrate to convert an amorphous silicon film into a polysilicon film.
Public/Granted literature
- US20040048453A1 Method for polysilicon crystallization by simultaneous laser and rapid thermal annealing Public/Granted day:2004-03-11
Information query