发明授权
- 专利标题: Capacitor and manufacturing method thereof
- 专利标题(中): 电容器及其制造方法
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申请号: US10311999申请日: 2002-12-23
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公开(公告)号: US06762107B2公开(公告)日: 2004-07-13
- 发明人: Hisayoshi Watanabe , Takashi Imanaka , Toru Uchida , Osamu Sengoku , Shinsuke Itoi , Munekazu Nishihara , Takaaki Higashida , Daisuke Suetsugu , Kenichi Yamamoto , Jun Katsube , Hirotaka Hisamura
- 申请人: Hisayoshi Watanabe , Takashi Imanaka , Toru Uchida , Osamu Sengoku , Shinsuke Itoi , Munekazu Nishihara , Takaaki Higashida , Daisuke Suetsugu , Kenichi Yamamoto , Jun Katsube , Hirotaka Hisamura
- 优先权: JP2001-131445 20010427
- 主分类号: H01L2120
- IPC分类号: H01L2120
摘要:
A capacitor (1) using a flexible substrate (2) includes a hole portion (6a) formed in a dielectric (6) to connect an upper electrode (7) to an external leader electrode (4). At least part of the hole portion (6a) extends from its lower end to upper end at an inclination between 0.1 and 20° with respect to a top surface of the external leader electrode (4). Then, an upper end corner of an inclined wall surface of the upper electrode (7), which inclines along the hole portion (6a) of the dielectric (6), has a downward inclination between 0.1 and 20°. A lower end corner of the inclined wall surface of the upper electrode (7), which inclines along the hole portion of the dielectric (6), has an upward inclination between 0.1 and 20°. As a result, stress concentration on the corners of the upper electrode (7) is drastically reduced to prevent the upper electrode (7) from cracking.
公开/授权文献
- US20030139016A1 Capacitor and manufacturing method 公开/授权日:2003-07-24