发明授权
- 专利标题: Semiconductor encapsulant resin having an additive with a gradient concentration
- 专利标题(中): 具有梯度浓度的添加剂的半导体密封树脂
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申请号: US09256227申请日: 1999-02-24
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公开(公告)号: US06762508B1公开(公告)日: 2004-07-13
- 发明人: Shigeo Kiso , Ichiro Kataoka , Satoru Yamada , Hidenori Shiotsuka , Hideaki Zenko
- 申请人: Shigeo Kiso , Ichiro Kataoka , Satoru Yamada , Hidenori Shiotsuka , Hideaki Zenko
- 优先权: JP10-047001 19980227; JP11-042912 19990222
- 主分类号: H01L2328
- IPC分类号: H01L2328
摘要:
Provided is an encapsulant resin for a semiconductor that effectively functions even with a relatively small amount of an additive. The encapsulant resin for a semiconductor is characterized in that the additive has a concentration gradient in the direction of thickness of the encapsulant resin. Specifically, the concentration gradient of the additive is established in the direction of thickness of the encapsulant resin by stacking at least two types of organic polymer resins containing different contents of the additive to form the encapsulant resin or by applying an electric field to the encapsulant resin to effect electrophoresis of the polar additive in the encapsulant resin.
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