发明授权
US06767786B1 Method for forming bottle trenches by liquid phase oxide deposition
有权
通过液相氧化物沉积形成瓶槽的方法
- 专利标题: Method for forming bottle trenches by liquid phase oxide deposition
- 专利标题(中): 通过液相氧化物沉积形成瓶槽的方法
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申请号: US10413229申请日: 2003-04-14
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公开(公告)号: US06767786B1公开(公告)日: 2004-07-27
- 发明人: Shian-Jyh Lin , Meng-Hung Chen , Chung-Yuan Lee
- 申请人: Shian-Jyh Lin , Meng-Hung Chen , Chung-Yuan Lee
- 主分类号: H01L218242
- IPC分类号: H01L218242
摘要:
Method for forming bottle trenches by liquid phase oxide deposition. The method includes the steps of providing a substrate having a pad layer formed thereon, and a trench formed in a predetermined position; forming a masking layer at the bottom part of the trench; using liquid phase deposition (LPD) to form an LPD oxide layer on the sidewalls of the trench; removing the masking layer to expose the bottom part of the trench; subjecting the LPD oxide layer to annealing; and etching the bottom part of the trench not covered by the LPD oxide layer to form a bottle trench.
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