发明授权
- 专利标题: Sidewall strap for complementary semiconductor structures and method of making same
-
申请号: US09945337申请日: 2001-08-31
-
公开(公告)号: US06770921B2公开(公告)日: 2004-08-03
- 发明人: Jigish D. Trivedi , Todd R. Abbott , Zhongze Wang
- 申请人: Jigish D. Trivedi , Todd R. Abbott , Zhongze Wang
- 主分类号: H01L2980
- IPC分类号: H01L2980
摘要:
Devices, structures, and methods for enhancing devices using dual-doped polycrystalline silicon are discussed. One aspect of the present invention includes a p-type strip having a top, a bottom, two sides, and two ends; an n-type strip having a top, a bottom, two sides, and two ends; and a conductive inhibitor strip that adjoins a portion of one of the two sides of the p-type strip and a portion of one of the two sides of the n-type strip so as to inhibit cross-diffusion between the p-type strip and the n-type strip while electrical connection between n-type and p-type polycrystalline silicon is maintained.
公开/授权文献
信息查询