- 专利标题: Nonvolatile semiconductor memory device and method for fabricating the same
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申请号: US10366420申请日: 2003-02-14
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公开(公告)号: US06770931B2公开(公告)日: 2004-08-03
- 发明人: Nobuyo Sugiyama , Hiromasa Fujimoto , Shinji Odanaka , Seiki Ogura
- 申请人: Nobuyo Sugiyama , Hiromasa Fujimoto , Shinji Odanaka , Seiki Ogura
- 优先权: JP2000-210887 20000712
- 主分类号: H01L2976
- IPC分类号: H01L2976
摘要:
A nonvolatile semiconductor memory device according to the present invention has a control gate electrode which is formed on the upper stage of a stepped portion formed in the principal surface of a substrate with a first insulating film interposed therebetween and a floating gate electrode which is formed to cover up the stepped portion, capacitively coupled to the side surface of the control gate electrode closer to the stepped portion with a second insulating film interposed therebetween, and opposed to the lower stage of the stepped portion with a third insulating film serving as a tunnel film interposed therebetween. Within the semiconductor substrate and in the vicinity of the stepped portion, there is formed a depletion control layer which is composed of a heavily doped impurity region and formed to extend from a position located under the floating gate electrode and at a distance from the upper corner of the stepped portion toward the lower corner of the stepped portion and adjoin the end portion of a drain region without reaching a step side region.
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