Invention Grant
- Patent Title: Field effect transistor
- Patent Title (中): 场效应晶体管
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Application No.: US10397561Application Date: 2003-03-25
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Publication No.: US06774393B2Publication Date: 2004-08-10
- Inventor: Dasarao K. Murti , Beng S. Ong , James M. Duff
- Applicant: Dasarao K. Murti , Beng S. Ong , James M. Duff
- Main IPC: H01L3524
- IPC: H01L3524

Abstract:
A field effect transistor composed of: an insulating layer; a gate electrode; a semiconductor layer including an organic semiconductor material and a binder resin; a source electrode; and a drain electrode, wherein the insulating layer, the gate electrode, the semiconductor layer, the source electrode, and the drain electrode are in any sequence as long as the gate electrode and the semiconductor layer both contact the insulating layer, and the source electrode and the drain electrode both contact the semiconductor layer.
Public/Granted literature
- US20030228718A1 Field effect transistor Public/Granted day:2003-12-11
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