发明授权
- 专利标题: Field effect transistor
- 专利标题(中): 场效应晶体管
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申请号: US10397561申请日: 2003-03-25
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公开(公告)号: US06774393B2公开(公告)日: 2004-08-10
- 发明人: Dasarao K. Murti , Beng S. Ong , James M. Duff
- 申请人: Dasarao K. Murti , Beng S. Ong , James M. Duff
- 主分类号: H01L3524
- IPC分类号: H01L3524
摘要:
A field effect transistor composed of: an insulating layer; a gate electrode; a semiconductor layer including an organic semiconductor material and a binder resin; a source electrode; and a drain electrode, wherein the insulating layer, the gate electrode, the semiconductor layer, the source electrode, and the drain electrode are in any sequence as long as the gate electrode and the semiconductor layer both contact the insulating layer, and the source electrode and the drain electrode both contact the semiconductor layer.
公开/授权文献
- US20030228718A1 Field effect transistor 公开/授权日:2003-12-11
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