Invention Grant
US06775006B2 Height scanning interferometry method and apparatus including phase gap analysis
有权
高度扫描干涉测量方法和装置包括相差分析
- Patent Title: Height scanning interferometry method and apparatus including phase gap analysis
- Patent Title (中): 高度扫描干涉测量方法和装置包括相差分析
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Application No.: US10053106Application Date: 2001-11-02
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Publication No.: US06775006B2Publication Date: 2004-08-10
- Inventor: Peter De Groot , James W. Kramer
- Applicant: Peter De Groot , James W. Kramer
- Main IPC: G01B902
- IPC: G01B902

Abstract:
An analysis method for analyzing height-scanning interferometry data from a test surface, the method including: calculating a coherence profile and a phase profile for the test surface based on the data; calculating an experimental phase gap map based on a difference between the phase profile and the coherence profile; filtering the experimental phase gap map to remove noise; and using the filtered phase gap map to improve an estimate for a height profile of the test surface.
Public/Granted literature
- US20020135775A1 Height scanning interferometry method and apparatus including phase gap analysis Public/Granted day:2002-09-26
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