发明授权
US06777108B1 Electrolytic copper foil with carrier foil and method for manufacturing the same and copper-clad laminate using the electrolytic copper foil with carrier foil 失效
具有载体箔的电解铜箔及其制造方法以及使用具有载体箔的电解铜箔的覆铜层压板

  • 专利标题: Electrolytic copper foil with carrier foil and method for manufacturing the same and copper-clad laminate using the electrolytic copper foil with carrier foil
  • 专利标题(中): 具有载体箔的电解铜箔及其制造方法以及使用具有载体箔的电解铜箔的覆铜层压板
  • 申请号: US09856350
    申请日: 2001-05-18
  • 公开(公告)号: US06777108B1
    公开(公告)日: 2004-08-17
  • 发明人: Shin-ichi ObataMakoto Dobashi
  • 申请人: Shin-ichi ObataMakoto Dobashi
  • 优先权: JP11-267652 19990921
  • 主分类号: B32B1504
  • IPC分类号: B32B1504
Electrolytic copper foil with carrier foil and method for manufacturing the same and copper-clad laminate using the electrolytic copper foil with carrier foil
摘要:
To control peel strength at an organic release interface between a carrier foil and a copper-microparticle layer which constitute an electrodeposited copper foil with carrier. In the present invention, (1) a barrier copper layer is formed on the release interface layer and copper microparticles are formed on the barrier layer; (2) the anti-corrosion treatment is carried out by use of a plating bath containing a single metallic component or a plurality of metallic components for forming an alloy, the plating bath(s) having a deposition potential less negative than −900 mV (vs. AgCl/Ag reference electrode); and (3) methods (1) and (2) are combined.
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