发明授权
US06777286B2 Compact SRAM cell incorporating refractory metal-silicon-nitrogen resistive elements and method for fabricating 失效
含有难熔金属 - 硅 - 氮电阻元件的紧凑SRAM单元及其制造方法

  • 专利标题: Compact SRAM cell incorporating refractory metal-silicon-nitrogen resistive elements and method for fabricating
  • 专利标题(中): 含有难熔金属 - 硅 - 氮电阻元件的紧凑SRAM单元及其制造方法
  • 申请号: US10616243
    申请日: 2003-07-08
  • 公开(公告)号: US06777286B2
    公开(公告)日: 2004-08-17
  • 发明人: Lawrence ClevengerLouis HsuLi-Kong Wang
  • 申请人: Lawrence ClevengerLouis HsuLi-Kong Wang
  • 主分类号: H01L218234
  • IPC分类号: H01L218234
Compact SRAM cell incorporating refractory metal-silicon-nitrogen resistive elements and method for fabricating
摘要:
A compact SRAM cell that incorporates refractory metal-silicon-nitrogen resistive elements as its pull-up transistors is described which includes a semi-conducting substrate, a pair of NMOS transfer devices formed vertically on the sidewalls of an etched substrate by a metal conductor providing electrical communication between an n+ region in the substrate and a bitline on top, a pair of pull-down nMOS devices on the substrate connected to ground interconnects, and a pair of vertical high-resistive elements formed of a refractory metal-silicon-nitrogen and function as a load for connecting to Vdd. The invention further describes a method for fabricating such compact SRAM cell.
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