Invention Grant
- Patent Title: Method for producing a porous silicon film
- Patent Title (中): 多孔硅膜的制造方法
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Application No.: US09994280Application Date: 2001-11-26
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Publication No.: US06780786B2Publication Date: 2004-08-24
- Inventor: George M. Dougherty
- Applicant: George M. Dougherty
- Main IPC: H01L2131
- IPC: H01L2131

Abstract:
A membrane structure comprising a silicon film having a grain structure including grains defining pores therebetween.
Public/Granted literature
- US20030100136A1 Thin film membrane structure Public/Granted day:2003-05-29
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