发明授权
- 专利标题： Photothermographic material
- 专利标题（中）： 光热成像材料
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申请号： US10262955申请日： 2002-10-03
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公开(公告)号： US06787298B2公开(公告)日： 2004-09-07
- 发明人: Takahiro Goto , Kohzaburoh Yamada , Tomoyuki Ohzeki , Eiichi Okutsu , Shoji Yasuda
- 申请人： Takahiro Goto , Kohzaburoh Yamada , Tomoyuki Ohzeki , Eiichi Okutsu , Shoji Yasuda
- 优先权： JP2001-307828 20011003; JP2002-100160 20020402
- 主分类号： G03C100
- IPC分类号： G03C100
摘要：
Disclosed is a highly sensitive photothermographic material containing on a support a silver salt of an organic acid, a photosensitive silver halide, a reducing agent, a binder and, for example, a compound of which one-electron oxidized derivative produced by one electron oxidation of the compound is capable of releasing two or more electrons with a bond cleavage.
公开/授权文献
- US20030194638A1 Photothermographic material 公开/授权日：2003-10-16