Invention Grant
- Patent Title: Production method of projection optical system
- Patent Title (中): 投影光学系统的制作方法
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Application No.: US10191428Application Date: 2002-07-10
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Publication No.: US06788389B2Publication Date: 2004-09-07
- Inventor: Youhei Fujishima , Hironori Ikezawa , Toshihiko Ozawa , Yasuhiro Omura , Takeshi Suzuki
- Applicant: Youhei Fujishima , Hironori Ikezawa , Toshihiko Ozawa , Yasuhiro Omura , Takeshi Suzuki
- Priority: JP2001-208837 20010710
- Main IPC: G03B2754
- IPC: G03B2754

Abstract:
A projection optical system in which an image of a first surface is projected onto a second surface based on a light beam having a predetermined wavelength. The projection optical system having at least one isometric system refractive member made of an isometric system crystal material. The isometric system crystal material transmits a light beam having the predetermined wavelength. The projection optical system also has an amorphous refractive member made of an amorphous material for compensating deterioration of optical performance due to intrinsic birefringence of the isometric system refractive member.
Public/Granted literature
- US20030053036A1 Production method of projection optical system Public/Granted day:2003-03-20
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