Invention Grant
- Patent Title: On-press exposure and on-press processing of a lithographic material
- Patent Title (中): 压制曝光和平版印刷材料的印刷加工
-
Application No.: US10068017Application Date: 2002-02-05
-
Publication No.: US06789480B2Publication Date: 2004-09-14
- Inventor: Joseph Vander Aa , Joan Vermeersch
- Applicant: Joseph Vander Aa , Joan Vermeersch
- Priority: EP01000017 20010216
- Main IPC: B41C110
- IPC: B41C110

Abstract:
A method of lithographic printing is disclosed which comprises the steps of unwinding a web of an imaging material from a supply spool, the imaging material comprising (1) a flexible lithographic base having a hydrophilic surface and (2) an image-recording layer which is removable in a single-fluid ink or can be rendered removable in a single-fluid ink by exposure to heat or light, wrapping the imaging material around a cylinder of a printing press, image-wise exposing the image-recording layer to heat or light, processing the image-recording layer by supplying single-fluid ink, thereby obtaining a printing master, printing by supplying single-fluid ink to the printing master which is mounted on a plate cylinder of the printing press, removing the printing master from the plate cylinder, preferably by winding up on an uptake spool. Since the image-recording layer can be processed by single-fluid ink, the imaging material is suitable for on-press processing in printing presses wherein no fountain solution is supplied to the plate. The method allows a rapid, fully automatic plate change with reduced press down time.
Public/Granted literature
- US20020112629A1 On-press exposure and on-press processing of a lithographic material Public/Granted day:2002-08-22
Information query