发明授权
- 专利标题： Method for fabricating thin metal layers from the liquid phase
- 专利标题（中）： 从液相制造薄金属层的方法
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申请号： US10390872申请日： 2003-03-17
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公开(公告)号： US06790737B2公开(公告)日： 2004-09-14
- 发明人: Manfred Schneegans , Wolfgang Jaeger , Michael Rogalli
- 申请人： Manfred Schneegans , Wolfgang Jaeger , Michael Rogalli
- 优先权： DE10211544 20020315
- 主分类号： H01L2120
- IPC分类号： H01L2120
摘要：
A method for producing metal layers on surfaces of semiconductor substrates includes the step of providing a semiconductor substrate having a surface. In this case, a precursor compound of a metal to be deposited is condensed out on the semiconductor surface and subsequently decomposed thermally. The method makes it possible to fill trenches with a high aspect ratio, it being possible to effectively suppress the formation of voids.
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