发明授权
- 专利标题: Structure having narrow pores
- 专利标题(中): 结构狭窄
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申请号: US10222901申请日: 2002-08-19
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公开(公告)号: US06790787B2公开(公告)日: 2004-09-14
- 发明人: Tatsuya Iwasaki , Tohru Den
- 申请人: Tatsuya Iwasaki , Tohru Den
- 优先权: JP1999-001269 19990106; JP1999-001268 19990106; JP1999-353094 19991213
- 主分类号: H01L2131
- IPC分类号: H01L2131
摘要:
A method of producing a structure having narrow pores includes a first step of bringing pore-guiding members into contact with upper and lower surfaces of a member comprising aluminum as a principal ingredient and a second step of anodizing the member comprising aluminum as the principal ingredient to form narrow pores. The pore-guiding members contain the same material as a principal ingredient. The second step includes preferably a step of transforming the member comprising aluminum as the principal ingredient into a porous body comprising alumina having narrow pores oriented substantially parallel to the interfaces between the pore-guiding members and the member comprising aluminum as the principal ingredient.
公开/授权文献
- US20030001150A1 Structure having narrow pores 公开/授权日:2003-01-02
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