发明授权
- 专利标题: Semiconductor light emission device and manufacturing method thereof
- 专利标题(中): 半导体发光装置及其制造方法
-
申请号: US10341465申请日: 2003-01-14
-
公开(公告)号: US06791117B2公开(公告)日: 2004-09-14
- 发明人: Shunji Yoshitake , Koichi Takahashi , Shinji Nunotani , Kenichi Ohashi
- 申请人: Shunji Yoshitake , Koichi Takahashi , Shinji Nunotani , Kenichi Ohashi
- 优先权: JP2002-006452 20020115
- 主分类号: H01L3300
- IPC分类号: H01L3300
摘要:
A semiconductor light emitting device is disclosed, which comprises a substrate, and a multi-layer semiconductor film formed on the substrate, the multi-layer semiconductor film including a plurality of semiconductor layers overlaid on the substrate, the semiconductor layers having a light emission layer for emitting a light, wherein the light is picked up at a first side of the multi-layer semiconductor film, which is a side opposite to the substrate, wherein a pattern having a light pickup surface is formed on a light emitting portion of the multi-layer semiconductor film, the light pickup surface is in a (111) plane or a plane in the vicinity of the (111) plane, and an unevenness is formed on the light pickup surface.
公开/授权文献
信息查询