发明授权
US06791310B2 Systems and methods for improved metrology using combined optical and electrical measurements 有权
使用组合光学和电气测量改进计量的系统和方法

  • 专利标题: Systems and methods for improved metrology using combined optical and electrical measurements
  • 专利标题(中): 使用组合光学和电气测量改进计量的系统和方法
  • 申请号: US10205868
    申请日: 2002-07-26
  • 公开(公告)号: US06791310B2
    公开(公告)日: 2004-09-14
  • 发明人: Walter Lee Smith
  • 申请人: Walter Lee Smith
  • 主分类号: G01R3126
  • IPC分类号: G01R3126
Systems and methods for improved metrology using combined optical and electrical measurements
摘要:
A combination metrology tool is disclosed for analyzing samples, and in particular semiconductor samples. The device includes a first measurement module for determining electrical characteristics of the sample. In general, such a measurement module will monitor voltage or capacitance characteristics to derive information such as carrier lifetimes, diffusion lengths and surface doping. The device also includes a second measurement module for determining compositional characteristics such as layer thickness, index of refraction and extinction coefficient. The second measurement module will include a light source for generating a probe beam which interacts with the sample. A detection system is provided for monitoring either the change in magnitude or polarization state of the probe beam. The output signals from both measurement modules are combined by a processor to more accurately evaluate the sample.
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