发明授权
- 专利标题: Systems and methods for improved metrology using combined optical and electrical measurements
- 专利标题(中): 使用组合光学和电气测量改进计量的系统和方法
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申请号: US10205868申请日: 2002-07-26
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公开(公告)号: US06791310B2公开(公告)日: 2004-09-14
- 发明人: Walter Lee Smith
- 申请人: Walter Lee Smith
- 主分类号: G01R3126
- IPC分类号: G01R3126
摘要:
A combination metrology tool is disclosed for analyzing samples, and in particular semiconductor samples. The device includes a first measurement module for determining electrical characteristics of the sample. In general, such a measurement module will monitor voltage or capacitance characteristics to derive information such as carrier lifetimes, diffusion lengths and surface doping. The device also includes a second measurement module for determining compositional characteristics such as layer thickness, index of refraction and extinction coefficient. The second measurement module will include a light source for generating a probe beam which interacts with the sample. A detection system is provided for monitoring either the change in magnitude or polarization state of the probe beam. The output signals from both measurement modules are combined by a processor to more accurately evaluate the sample.
公开/授权文献
- US20020186036A1 Combination optical and electrical metrology apparatus 公开/授权日:2002-12-12
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