发明授权
- 专利标题： Exposure apparatus, device manufacturing method, semiconductor manufacturing factory, and exposure apparatus maintenance method
- 专利标题（中）： 曝光装置，装置制造方法，半导体制造工厂和曝光装置维护方法
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申请号： US10022506申请日： 2001-12-20
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公开(公告)号： US06791670B2公开(公告)日： 2004-09-14
- 发明人: Yoshikazu Miyajima , Kazuhito Outuka , Keiji Emoto
- 申请人： Yoshikazu Miyajima , Kazuhito Outuka , Keiji Emoto
- 优先权： JP2000-395819 20001226
- 主分类号： G03B2742
- IPC分类号： G03B2742
摘要：
A linear motor apparatus includes a movable member having a magnet, and a coil wound about the magnet so as to generate a drive force for driving the movable member and having a multi-layer structure formed by winding a foil-like conductor and an insulating layer. The foil-like conductor (i) has a plurality of partial coils having identical current application/rotation directions, and the plurality of partial coils are formed in such a way that the foil-like conductor forms a continuous, seamless strip, and (ii) is continuously wound in a multilayered, aligned state to form the coil, and adjacent layers of the foil-like conductor are insulated by the insulating layer.
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