- 专利标题: Method and apparatus for specimen fabrication
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申请号: US10699853申请日: 2003-11-04
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公开(公告)号: US06794663B2公开(公告)日: 2004-09-21
- 发明人: Hiroyasu Shichi , Tohru Ishitani , Hidemi Koike , Kaoru Umemura , Eiichi Seya , Mitsuo Tokuda , Satoshi Tomimatsu , Hideo Kashima , Muneyuki Fukuda
- 申请人: Hiroyasu Shichi , Tohru Ishitani , Hidemi Koike , Kaoru Umemura , Eiichi Seya , Mitsuo Tokuda , Satoshi Tomimatsu , Hideo Kashima , Muneyuki Fukuda
- 优先权: JP2000-342372 20001106; JP2001-204768 20010705
- 主分类号: G21G500
- IPC分类号: G21G500
摘要:
A sample fabricating method of irradiating a sample with a focused ion beam at an incident angle less than 90 degrees with respect to the surface of the sample, eliminating the peripheral area of a micro sample as a target, turning a specimen stage around a line segment perpendicular to the sample surface as a turn axis, irradiating the sample with the focused ion beam while the incident angle on the sample surface is fixed, and separating the micro sample or preparing the micro sample to be separated. A sample fabricating apparatus for forming a sample section in a sample held on a specimen stage by scanning and deflecting an ion beam, wherein an angle between an optical axis of the ion beam and the surface of the specimen stage is fixed and formation of a sample section is controlled by turning the specimen stage.
公开/授权文献
- US20040089821A1 Method and apparatus for specimen fabrication 公开/授权日:2004-05-13
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