发明授权
- 专利标题: Non-volatile memory
- 专利标题(中): 非易失性存储器
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申请号: US10616083申请日: 2003-07-08
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公开(公告)号: US06794701B2公开(公告)日: 2004-09-21
- 发明人: Tung-Cheng Kuo , Chien-Hung Liu , Shyi-Shuh Pan , Shou-Wei Huang
- 申请人: Tung-Cheng Kuo , Chien-Hung Liu , Shyi-Shuh Pan , Shou-Wei Huang
- 优先权: TW91105280 20020320
- 主分类号: H01L27108
- IPC分类号: H01L27108
摘要:
A non-volatile memory and the fabrication thereof are described. The non-volatile memory comprises a word-line on a substrate, a charge trapping layer between the word-line and the substrate, and a contact electrically connecting with the word-line over the substrate. In addition, there is a protective metal line electrically connecting with the word-line and with a grounding doped region in the substrate via different contacts, respectively. The protective metal line has a resistance higher than that of the word-line.
公开/授权文献
- US20040105321A1 Non-volatile memory and fabrication thereof 公开/授权日:2004-06-03
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