发明授权
- 专利标题: Low-pressure dryer and low-pressure drying method
- 专利标题(中): 低压干燥机和低压干燥方法
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申请号: US10384571申请日: 2003-03-11
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公开(公告)号: US06796054B2公开(公告)日: 2004-09-28
- 发明人: Tomohide Minami , Hiroshi Shinya , Takahiro Kitano
- 申请人: Tomohide Minami , Hiroshi Shinya , Takahiro Kitano
- 优先权: JP2002-067312 20020312; JP2002-067313 20020312
- 主分类号: F26B300
- IPC分类号: F26B300
摘要:
A low-pressure dryer dries a substrate applied a coating solution thereon at low pressure. The dryer includes an airtight chamber installing a substrate table to place the substrate thereon; a diffuser plate, provided as facing the substrate placed on the substrate table with a gap, for discharging gas existing in the gap toward outside, the diffuser plate having a size almost the same as or larger than the substrate; a substrate-temperature adjuster, installed in the substrate table, for adjusting a temperature of the substrate; and a decompression mechanism for decompressing the airtight chamber. The diffuser plate has a temperature adjuster for making temperature adjustments to have a temperature difference between a first region and a second region of the diffuser plate, the first region facing a center region of the substrate, the second region being outside the first region and including a region facing an outer region of the substrate.
公开/授权文献
- US20030172542A1 Low-pressure dryer and low-pressure drying method 公开/授权日:2003-09-18