发明授权
US06801392B2 Soft magnetic film having high saturation magnetic flux density, thin film magnetic head using the same, and methods of producing the soft magnetic film and the thin film magnetic head 有权
具有高饱和磁通密度的软磁性膜,使用其的薄膜磁头以及制造软磁性膜和薄膜磁头的方法

  • 专利标题: Soft magnetic film having high saturation magnetic flux density, thin film magnetic head using the same, and methods of producing the soft magnetic film and the thin film magnetic head
  • 专利标题(中): 具有高饱和磁通密度的软磁性膜,使用其的薄膜磁头以及制造软磁性膜和薄膜磁头的方法
  • 申请号: US10041377
    申请日: 2002-01-08
  • 公开(公告)号: US06801392B2
    公开(公告)日: 2004-10-05
  • 发明人: Mitsuo KawasakiYoshihiro Kanada
  • 申请人: Mitsuo KawasakiYoshihiro Kanada
  • 优先权: JP2001-001471 20010109; JP2001-001458 20010109
  • 主分类号: G11B5127
  • IPC分类号: G11B5127
Soft magnetic film having high saturation magnetic flux density, thin film magnetic head using the same, and methods of producing the soft magnetic film and the thin film magnetic head
摘要:
A lower pole layer and/or an upper pole layer is formed by plating a NiFe alloy having a Fe composition ratio of 76% by mass to 90% by mass, or having an average crystal grain diameter of 130 Å to 175 Å and a Fe composition ratio of 70% by mass to 90% by mass. As a result, the saturation magnetic flux density can be increased to 1.9 T or more, and a thin film magnetic head excellent for a higher recording density can be manufactured.
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