Invention Grant
US06803934B2 Exposure unit support having a primary resonance frequency higher than that of a mirror in the exposure unit 有权
具有高于曝光单元中的反射镜的初级共振频率的曝光单元支撑

  • Patent Title: Exposure unit support having a primary resonance frequency higher than that of a mirror in the exposure unit
  • Patent Title (中): 具有高于曝光单元中的反射镜的初级共振频率的曝光单元支撑
  • Application No.: US09900880
    Application Date: 2001-07-10
  • Publication No.: US06803934B2
    Publication Date: 2004-10-12
  • Inventor: Akihiro Shimizu
  • Applicant: Akihiro Shimizu
  • Priority: JP2000-210836 20000712
  • Main IPC: G03G1504
  • IPC: G03G1504
Exposure unit support having a primary resonance frequency higher than that of a mirror in the exposure unit
Abstract:
An image forming apparatus includes a supporting member extended between first and second frames and supporting an exposure unit, wherein the primary resonance frequency of the supporting member is higher than that of a mirror provided in the exposure unit, whereby the supporting member is prevented from being caused to resonate by oscillation generated in the driving system of the apparatus main body to thereby prevent the mirror from oscillating.
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