发明授权
- 专利标题： Method and structure to segment RF coupling to silicon electrode
- 专利标题（中）： RF耦合到硅电极的方法和结构
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申请号： US10355203申请日： 2003-01-31
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公开(公告)号： US06806653B2公开(公告)日： 2004-10-19
- 发明人: Eric J. Strang , Andrej S. Mitrovic
- 申请人： Eric J. Strang , Andrej S. Mitrovic
- 主分类号： H01J724
- IPC分类号： H01J724
摘要：
An electrode assembly for use in a plasma processing system including a base electrode adapted to be coupled to a source of RF energy, a removable electrode removably coupled to the base electrode, and a material interposed between a surface of the base electrode and a surface of the removable electrode.
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