A method for manufacturing an anti-scatter grid having a desired height. The method includes positioning a bottom surface of a mask of dielectric material, with a depth at least equal to the desired height of the anti-scatter grid, on a sheet of metal, cutting first and second series of intrinsically focused slots through a top surface of the mask to the sheet of metal, plating the sheet of metal at the bottom of each of the slots of the mask with a radiopaque material to form partition walls of the anti-scatter grid, and continuing to plate the radiopaque material into the slots of the mask until the desired height of the anti-scatter grid is achieved.