发明授权
- 专利标题： System and method to monitor reticle heating
- 专利标题（中）： 监控标线加热的系统和方法
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申请号： US10050456申请日： 2002-01-16
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公开(公告)号： US06809793B1公开(公告)日： 2004-10-26
- 发明人: Khoi A. Phan , Bhanwar Singh , Ramkumar Subramanian , Bharath Rangarajan
- 申请人： Khoi A. Phan , Bhanwar Singh , Ramkumar Subramanian , Bharath Rangarajan
- 主分类号： G03B2752
- IPC分类号： G03B2752
摘要：
A system and method are disclosed which enable temperature of a substrate, such as mask or reticle, to be monitored and/or regulated. One or more temperature sensors are associated with the substrate to sense substrate temperature during exposure by an exposing source. The sensed temperature is used to control one or more process parameters of the exposure to help maintain the substrate at or below a desired temperature.
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