发明授权
- 专利标题： Topographically aligned layers and method for adjusting the relative alignment of layers and apparatus therefor
- 专利标题（中）： 用于调整层的相对对准的方法和用于其的设备的方法
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申请号： US09992599申请日： 2001-11-06
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公开(公告)号： US06813574B1公开(公告)日： 2004-11-02
- 发明人: Sanjay K. Yedur , Bhanwar Singh , Bharath Rangarajan , Ramkumar Subramanian
- 申请人： Sanjay K. Yedur , Bhanwar Singh , Bharath Rangarajan , Ramkumar Subramanian
- 主分类号： G01N2186
- IPC分类号： G01N2186
摘要：
Patterned layers in an integrated circuit (IC) or other device are aligned in conjunction with the detection of the topology of the layers. The topology can be used to determine the location of a metrology mark and/or to compensate for a horizontal shift in the apparent location of the metrology mark. Precise detection of topography can be achieved without physical contact with the IC or other device with an atomic force microscope.
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