发明授权
- 专利标题: End face polishing apparatus
- 专利标题(中): 端面抛光装置
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申请号: US10199822申请日: 2002-07-19
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公开(公告)号: US06817931B2公开(公告)日: 2004-11-16
- 发明人: Kouji Minami
- 申请人: Kouji Minami
- 优先权: JP2001-276759 20010912
- 主分类号: B24B100
- IPC分类号: B24B100
摘要:
An end face polishing apparatus has a lapping board mounted to undergo rotation and revolving movement, a lapping member having a polishing surface and disposed on the lapping board for rotation and revolving movement therewith, a polishing fixture for supporting a workpiece having an end face, and a pressing member. During a polishing operation, preselected portion thereof to bring the end face of the workpiece into pressure contact with the polishing surface of the lapping member and to dispose the preselected portion at a position closer to the polishing surface than to a center of gravity of the polishing fixture to thereby polish the end face of the workpiece during rotation and revolving movement of the lapping board.
公开/授权文献
- US20030060147A1 End face polishing apparatus 公开/授权日:2003-03-27
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