发明授权
- 专利标题： Exposure apparatus, and device manufacturing method
- 专利标题（中）： 曝光装置和装置制造方法
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申请号： US09712979申请日： 2000-11-16
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公开(公告)号： US06819396B1公开(公告)日： 2004-11-16
- 发明人: Masayuki Tanabe , Yasuaki Fukuda , Masami Tsukamoto
- 申请人： Masayuki Tanabe , Yasuaki Fukuda , Masami Tsukamoto
- 优先权： JP11-325785 19991116
- 主分类号： G03B2752
- IPC分类号： G03B2752
摘要：
Disclosed is an exposure apparatus which includes an optical element, a gas supplying unit for supplying a predetermined gas around the optical element, and an organic compound decomposition mechanism for decomposing an organic compound in the gas. This structure prevents adhesion of organic compounds to the optical element without a necessity of using many filters in combination.