Invention Grant
- Patent Title: Process to form narrow write track for magnetic recording
- Patent Title (中): 形成用于磁记录的窄写轨的过程
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Application No.: US10210955Application Date: 2002-08-02
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Publication No.: US06821717B2Publication Date: 2004-11-23
- Inventor: Charles C. Lin , Kochan Ju , Jeiwei Chang
- Applicant: Charles C. Lin , Kochan Ju , Jeiwei Chang
- Main IPC: G11B531
- IPC: G11B531

Abstract:
As the recording density of magnetic disk drives approaches 100 Gbits/in2, write track lengths of about 0.10 microns will be required. This cannot be accomplished using conventional photolithography. The present invention solves this problem by first forming on the bottom pole of the write head a cavity in a layer of photoresist, using conventional means. A seed layer of non-magnetic material is electrolessly laid down, following which a second layer of photoresist is deposited and patterned to form a second cavity that symmetrically surrounds the first one, thereby forming a mold around it. Ferromagnetic metal is then electro-deposited in this mold to form the top magnetic pole. Following the removal of all photoresist and a brief selective etch of the bottom pole, an extremely narrow write head is obtained.
Public/Granted literature
- US20040020778A1 Process to form narrow write track for magnetic recording Public/Granted day:2004-02-05
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