发明授权
- 专利标题: Partial turn coil for generating a plasma
- 专利标题(中): 用于产生等离子体的部分回转线圈
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申请号: US10211472申请日: 2002-08-01
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公开(公告)号: US06824658B2公开(公告)日: 2004-11-30
- 发明人: Praburam Gopalraja , Bradley O. Stimson
- 申请人: Praburam Gopalraja , Bradley O. Stimson
- 主分类号: C23C1434
- IPC分类号: C23C1434
摘要:
A partial turn coil disposed in a semiconductor fabrication chamber for generating a plasma and sputter depositing coil material onto a substrate can exhibit reduced RF voltages.
公开/授权文献
- US20030051994A1 Partial turn coil for generating a plasma 公开/授权日:2003-03-20